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Alphabetical Listing of Reference Documents by Title
NOTE: [PDF] links require Acrobat Reader from Adobe.

450mm: What Will It Cost To Get There?
Abstract: Issues for the industry to convert from the current 300mm wafer to a future 450mm wafer, slated for 2012. Historically, changing from one wafer size to the next has been very expensive and results in inefficiencies and more resource requirements.
Source: Future Fab International (Vol 20)

Breakthrough Design Team - With a Little Help from RMI, Texas Instruments Breaks New Ground [PDF]
Abstract: Steps Texas Instruments has taken to design energy and water efficiency into a new semiconductor manufacturing facility in Richardson, Texas. By Page, C.
Source: Rocky Mountain Institute

Draft Strategy for National Clean Water Industrial Regulations
Abstract: EPA's Draft Strategy for National Clean Water Industrial Regulations. Includes info on regulations and effluents associated with semiconductor manufacturing.
Source: US Environmental Protection Agency

Efficient Water Use for Texas: Policies, Tools, and Management Strategies
Abstract: Disccusses why and how semiconductor fabrication plants are in an ideal position to enact sequential water reuse. Cites successes. (By Gerston, MacLeod, & Jones).
Source: Texas Agricultural Experiment Station at Texas A&M University.

LSI Logic - Green Permit Annual Report [PDF]
Abstract: Strategies used by LSI Logic to reduce chemical use and waste in semiconductor manufacturing.
Source: LSI Logic Corporation

Recycle Spent Rinse Waters with Electrodeionization (EDI) [PDF]
Abstract: Performance of a small separate-bed EDI cell fed by representative spent rinse waters. EDI is growing in importance as an alternative, primary ion-exchange process useful for recycling spent rinse waters. By Donovan & Morrison.
Source: Sandia National Laboratories

Reducing Water Consumption in Semiconductor Fabs
Abstract: Article based on a paper presented in 2002 showing numerous implementations at Fairchild Semiconductor to reduce ultrapure water or deionized water use. By Klusewitz & McVeigh.
Source: / 13th annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference

Reducing Water Usage in Semiconductor Manufacturing
Abstract: Semiconductor manufacturers in many locations are being denied requests for additional water to support plans for expanding production. Discusses four approaches to reducing water use. (By Donovan, R)
Source: CleanRooms

The 1.7 Kilogram Microchip: Energy and Material Use in the Production of Semiconductor Devices [PDF]
Abstract: By Williams, E., et al. Describes the amount of inputs required to produce a single chip, which amounts to about 630 times the weight of the chip itself.
Source: Environmental Science and Technology

Ultrapure Water Production
Abstract: Description of ultrapure water generation processes. By DeGenova, J.
Source: Department of Chemical and Environmental Engineering, University of Arizona

Ultrapure Water: Rewards of Recycling
Abstract: Benefits of recycling water in semiconductor fabs. Semiconductor International, (February 1998): 71-76. (Not available online).

Water Usage Reduction in a Semiconductor Fabricator (Abstract Only)
Abstract: Actual (by Klusewitz & Veigh) article describes methodology and results to reduce the ultra pure water usage in the Fairchild Mountaintop 6" fab.
Source: Congrès ACMS 2002


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Hub Last Updated: 3/11/2013